Embedded Files
Heater and Thermal Sensor
AL Plate + All Polyimide Heater
Maximum operating temperature up to 260 °C
Patterned heater structure with power source, polyimide insulation, and aluminum plate
Suitable for Photoresist Bake Stations
Compatible with Electrostatic Chucks (ESC)
Applicable to Shower Head heating applications
AL Plate + MICA Heater
Maximum operating temperature up to 400 °C
Patterned heater construction with power source, mica insulation, and aluminum plate
Designed for dry etch processes
Suitable for CVD and PVD applications
AL Plate + MICA Heater
Maximum operating temperature up to 600 °C
Patterned heater construction with power source, mica insulation, and SiC plate
Designed for dry etch processes
Suitable for CVD and PVD applications
Typical 3-zone profiled heater design for 300 mm wafer chucks
Expandable to multi-zone configurations beyond three zones
Custom sensor solutions tailored for semiconductor applications:
- Fast response time
- Embedded sensor integration within the chuck
- High accuracy and high reliability
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